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METAL OXIDE SEMICONDUCTOR TECHNOLOGY SCALING ISSUES AND THEIR RELATION TO SUBMICRON LITHOGRAPHYTASCH AF JR.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 176-180; BIBL. 6 REF.Article

SHAPED BEAMS FOR INTEGRATED CIRCUIT FABRICATIONWEBER EV.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 190-194; BIBL. 15 REF.Article

INTRALEVEL HYBRID RESIST PROCESS FOR THE FABRICATION OF METAL OXIDE SEMICONDUCTOR DEVICES WITH SUBMICRON GATE LENGTHSHELBERT JN; SEESE PA; GONZALES AJ et al.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 185-189; BIBL. 6 REF.Article

STATE OF ART OF ACRYLATE RESISTS: AN OVERVIEW OF POLYMER STRUCTURE AND LITHOGRAPHICMOREAU WM.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 181-184; BIBL. 76 REF.Article

THE CARACTERISTICS AND PROPERTIES OF OPTIMISED AMORPHOUS SILICON FIELD EFFECT TRANSISTORSMACKENZIE KD; SNELL AJ; FRENCH I et al.1983; APPLIED PHYSICS. A, SOLIDS AND SURFACES; ISSN 0721-7250; DEU; DA. 1983; VOL. 31; NO 2; PP. 87-92; BIBL. 22 REF.Article

AN ELECTROTHERMAL MODEL FOR THRESHOLD SWITCHING IN THIN AMORPHOUS CHALCOGENIDE FILMSSHAW MP; SUBHANI KF.1981; SOLID-STATE ELECTRON.; ISSN 0038-1101; GBR; DA. 1981; VOL. 24; NO 3; PP. 233-248; BIBL. 42 REF.Article

THEORETICAL ANALYSIS OF AMORPHOUS-SILICON FIELD-EFFECT-TRANSISTORSKISHIDA S; NARUKE Y; UCHIDA Y et al.1983; JAPANESE JOURNAL OF APPLIED PHYSICS; ISSN 0021-4922; JPN; DA. 1983; VOL. 22; NO 3; PART. 1; PP. 511-517; BIBL. 7 REF.Article

SWITCHING BEHAVIOUR OF AMORPHOUS THRESHOLD DEVICES IN THE GAP CONFIGURATION.MADAN A; ALLISON J; THOMPSON MJ et al.1976; J. NON-CRYST. SOLIDS; NETHERL.; DA. 1976; VOL. 21; NO 1; PP. 1-21; BIBL. 15 REF.Article

A SELF-ALIGNMENT PROCESS FOR AMORPHOUS SILICON THIN FILM TRANSISTORSKODAMA T; TAKAGI N; KAWAI S et al.1982; ELECTRON DEVICE LETTERS; ISSN 0193-8576; USA; DA. 1982; VOL. 3; NO 7; PP. 187-189; BIBL. 12 REF.Article

TRANSFORMATION FROM OHMIC TO OFFSET BEHAVIOR FOR THE ON STATE OF AN AMORPHOUS SEMICONDUCTOR THRESHOLD SWITCH FOR INTERRUPTIONS GREATER THAN 12 NSVEZZOLI GC.1979; APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1979; VOL. 35; NO 3; PP. 288-290; BIBL. 8 REF.Article

NOTE ON THE THICKNESS DEPENDENCE OF THE THRESHOLD VOLTAGE OF AMORPHOUS SWITCHING DEVICES.BARANCOK D; DIESKA P.1976; ACTA PHYS. SLOV.; TCHECOSL.; DA. 1976; VOL. 26; NO 4; PP. 277-280; BIBL. 6 REF.Article

THE ON-STATE OF THE AMORPHOUS SEMICONDUCTOR DEVICE.BUCKLEY WD.1976; APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 29; NO 11; PP. 743-746; BIBL. 4 REF.Article

ON THE RELIABILITY OF AMORPHOUS CHALCOGENIDE SWITCHING DEVICESSCHUOCKER D; RIEDER G.1978; J. NON-CRYST. SOLIDS; NLD; DA. 1978; VOL. 29; NO 3; PP. 397-407; BIBL. 16 REF.Article

AMORPHOUS SEMICONDUCTOR DEVICES: MEMORY AND SWITCHING MECHANISMLAKSHMINARAYAN KN; SRIVASTAVA KK; PANWAR OS et al.1981; J. INSTIT. ELECTRON. TELECOMMUNIC. ENGRS; IND; DA. 1981; VOL. 27; NO 1; PP. 16-19; BIBL. 9 REF.Article

REVERSIBLE MONOPOLAR SWITCHING IN VANADIUM-TELLURITE GLASS THRESHOLD DEVICESGATTEF E; DIMITRIEV Y.1979; PHILOS. MAG., B; GBR; DA. 1979; VOL. 40; NO 3; PP. 233-242; BIBL. 35 REF.Article

AMORPHOUS-SILICON FET ARRAY FOR LCD PANELKATOH K; YASUI M; KUNIYASU S et al.1983; ELECTRONICS LETTERS; ISSN 0013-5194; GBR; DA. 1983; VOL. 19; NO 14; PP. 506-507; BIBL. 10 REF.Article

ELECTRIC FIELD LINE BENDING LIMITED ELASTOMER DEFORMATION IN AN A-SE TYPE DEFORMOGRAPHIC LIGHT WAVE.LAKATOS AI.1977; J. APPL. PHYS.; U.S.A.; DA. 1977; VOL. 48; NO 6; PP. 2346-2355; BIBL. 9 REF.Article

NEW AMORPHOUS-SILICON ELECTRICALLY PROGRAMMABLE NONVOLATILE SWITCHING DEVICEOWEN AE; LE COMBER PG; SARRABAYROUSE G et al.1982; IEE PROCEEDINGS. PART I. SOLID-STATE AND ELECTRON DEVICES; ISSN 0143-7100; GBR; DA. 1982; VOL. 129; NO 2; PP. 51-54; BIBL. 17 REF.Article

Commutation à basse température de chalcogénures vitreux semiconducteursKVASKOV, V. B; PAROL, N. V; IOFIS, N. A et al.Fizika i tehnika poluprovodnikov. 1984, Vol 18, Num 11, pp 2079-2082, issn 0015-3222Article

FURTHER STUDIES OF MEMORY SWITCHING IN COPPER-CALCIUM-PHOSPHATE GLASS DEVICESMORIDI GR; HOGARTH CA.1978; INTERNATION. J. ELECTRON.; GBR; DA. 1978; VOL. 44; NO 3; PP. 297-304; BIBL. 10 REF.Article

THE TEMPERATURE DEPENDENCE OF THE NON-OHMIC CURRENT AND SWITCHING CHARACTERISTICS OF A CHALCOGENIDE GLASS.THOMAS CB.1976; J. PHYS. D; G.B.; DA. 1976; VOL. 9; NO 18; PP. 2587-2596; BIBL. 34 REF.Article

DISPOSITIFS SEMICONDUCTEURS AMORPHESADLER D.1978; USP. FIZ. NAUK; SUN; DA. 1978; VOL. 125; NO 4; PP. 707-730; BIBL. 5 REF.Article

MONOSTABLE SWITCHING IN AMORPHOUS CHALCOGENIDE SEMICONDUCTORS.THOMAS CB; ROGERS BD; LETTINGTON AH et al.1976; J. PHYS. D; G.B.; DA. 1976; VOL. 9; NO 18; PP. 2571-2586; BIBL. 30 REF.Article

CARACTERISATION PAR MESURES ELECTRIQUES ET MICROANALYSE NUCLEAIRE DE LA DEGRADATION DE SEMICONDUCTEURS AMORPHES EN COUCHES MINCES LIEE A LA DIFFUSION DES ELECTRODES.MARSAUD S.1976; VILLEURBANNE; INST. PHYS. NUCL.; DA. 1976; PP. 1-61; BIBL. 3 P.; (THESE DOCT. 3EME CYCLE PHYS., PHYS. NUCL., OPTION CHIM. NUCL.; CLAUDE BERNARD LYON I)Thesis

Effet de commutation «inverse» dans les semiconducteurs vitriformes chalcogènesGLEBOV, A. S; PETROV, I. M; SAZHIN, B. N et al.Žurnal tehničeskoj fiziki. 1984, Vol 54, Num 2, pp 382-383, issn 0044-4642Article

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